• 文献标题:   The influence of copper addition on the electrical conductivity and charge transfer resistance of reduced graphene oxide (rGO)
  • 文献类型:   Article
  • 作  者:   ISKANDAR F, ABDILLAH OB, STAVILA E, AIMON AH
  • 作者关键词:  
  • 出版物名称:   NEW JOURNAL OF CHEMISTRY
  • ISSN:   1144-0546 EI 1369-9261
  • 通讯作者地址:   Inst Teknol Bandung
  • 被引频次:   3
  • DOI:   10.1039/c8nj03614d
  • 出版年:   2018

▎ 摘  要

The electrical conductivity and charge transfer resistance (R-ct) of reduced graphene oxide (rGO) with the addition of copper are reported. The samples of rGO with copper addition were successfully synthesized via in situ chemical exfoliation using a microwave-assisted technique. Annealing was performed at various temperatures to determine the optimal annealing temperature for the sample with the best electrical conductivity performance. The resulting samples were characterized using attenuated total reflectance-Fourier transform infrared (ATR-FTIR) characterization, X-ray diffraction (XRD), Raman spectrometry, energy dispersive X-ray (EDX) spectrometry, scanning electron microscopy (SEM), four-point probe, and electrochemical impedance spectroscopy (EIS). The highest conductivity value of 24.85 S cm(-1) was obtained for the rGO sample with addition of 1 wt% copper and annealing treatment at 300 degrees C for 45 minutes. The electrochemical properties of the samples were characterized using electrochemical impedance spectroscopy (EIS), resulting in a charge transfer resistance (R-ct) value of 3.86 Omega for sample B with the addition of 1 wt% copper. A possible reaction mechanism and explanations for the influence of Cu, Cu2O, and CuO on the electrical conductivity and charge transfer resistance value of rGO are also described in this report.