▎ 摘　　要

We review the results of growing few layer graphene on alpha-SiC with different surface orientations. To this end we have used successively a pure {000-1} C face, a 8 degrees-off one, a nonpolar {11-20} surface and, finally, a 8 degrees-off Si face and a pure (exactly {0001}-oriented) Si one. Without any need for complex hydrogen annealing, we have shown that a pure C or a 8 degrees-off C or even a pure {11-20} surface allows the growth of single layer epitaxial graphene sheets that are strain-free, p-type, low doped and exhibit reasonably high carrier mobility. This is not the case on pure Si or 8 degrees-off Si faces on which strained material is constantly found with heavy n-type doping and low carrier mobility.