• 文献标题:   Relaxation of moire patterns for slightly misaligned identical lattices: graphene on graphite
  • 文献类型:   Article
  • 作  者:   VAN WIJK MM, SCHURING A, KATSNELSON MI, FASOLINO A
  • 作者关键词:   graphene, moire, atomistic simulation
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:   Radboud Univ Nijmegen
  • 被引频次:   30
  • DOI:   10.1088/2053-1583/2/3/034010
  • 出版年:   2015

▎ 摘  要

We study the effect of atomic relaxation on the structure of moire patterns in twisted graphene on graphite and double layer graphene by large scale atomistic simulations. The reconstructed structure can be described as a superlattice of 'hot spots' with vortex-like behaviour of in-plane atomic displacements and increasing out-of-plane displacements with decreasing angle. These lattice distortions affect both scalar and vector potential and the resulting electronic properties. At low misorientation angles (< similar to 1 degrees) the optimized structures deviate drastically from the sinusoidal modulation which is often assumed in calculations of the electronic properties. The proposed structure might be verified by scanning probe microscopy measurements.