• 文献标题:   Simulation of Graphene Base Transistors With Bilayer Tunnel Oxide Barrier: Model Calibration and Performance Projection
  • 文献类型:   Article
  • 作  者:   DI LECCE V, GNUDI A, GNANI E, REGGIANI S, BACCARANI G
  • 作者关键词:   graphene, modeling, simulation, transistor
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   Univ Bologna
  • 被引频次:   0
  • DOI:   10.1109/LED.2016.2606391
  • 出版年:   2016

▎ 摘  要

A simulation study of the graphene base transistor is presented based on the most recent experimental results involving a novel double-layer emitter-to-base insulator made of TmSiO and TiO2. The simulations are based on a 1-D quantum transport model with the effective mass approximation, and reproduce well the experiments both in terms of current levels and common-base current gain a. Performance projections are then investigated: with transparent graphene, the cutoff frequency is predicted to increase from 1 to 100 MHz by reducing the thickness of TmSiO from 1 to 0.5 nm. In order to go beyond this limit toward the terahertz range, a material with a lower barrier height than TmSiO should be considered. A technological breakthrough boosting the graphene interface quality is also needed in order to obtain acceptable values of alpha, which are still low.