• 文献标题:   Model for the epitaxial growth of graphene on 6H-SiC(0001)
  • 文献类型:   Article
  • 作  者:   MING F, ZANGWILL A
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   1098-0121
  • 通讯作者地址:   Georgia Inst Technol
  • 被引频次:   21
  • DOI:   10.1103/PhysRevB.84.115459
  • 出版年:   2011

▎ 摘  要

We introduce a kinetic model for the growth of epitaxial graphene on 6H-SiC(0001). The model applies to vicinal surfaces composed of half-unit-cell-height steps where experimental results show that step flow sublimation of SiC promotes the formation and growth of graphene strips parallel to the step edges. The model parameters are effective energy barriers for the nucleation and subsequent propagation of graphene at the step edges. Using kinetic Monte Carlo simulations and rate equations, two distinct growth regimes emerge from a study of the layer coverage and distribution of top-layer graphene strip widths as a function of total coverage, vicinal angle, and the model parameters. One regime is dominated by the coalescence of strips. The other regime is dominated by a "climbover" process, which facilitates the propagation of graphene from one terrace to the next. Comparing our results to scanning microscopy studies will provide the first quantitative insights into the kinetics of growth for this unique epitaxial system.