• 文献标题:   Significant Radiation Tolerance and Moderate Reduction in Thermal Transport of a Tungsten Nanofilm by Inserting Monolayer Graphene
  • 文献类型:   Article
  • 作  者:   SI SY, LI WQ, ZHAO XL, HAN M, YUE YN, WU W, GUO SS, ZHANG XG, DAI ZG, WANG XW, XIAO XG, JIANG CZ
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   Wuhan Univ
  • 被引频次:   15
  • DOI:   10.1002/adma.201604623
  • 出版年:   2017

▎ 摘  要

Tungsten-graphene multilayer composites are fabricated using a stacking method. The thermal resistance induced by the graphene interlayer is moderate. An ion-implantation method is used to verify the radiation tolerance. The results show that graphene inserted among tungsten films plays a dominant role in reducing radiation damage. Furthermore, the performance of different tungsten period-thicknesses in radiation tolerance is systematically analyzed.