• 文献标题:   Silicon Nitride Gate Dielectrics and Band Gap Engineering in Graphene Layers
  • 文献类型:   Article
  • 作  者:   ZHU WJ, NEUMAYER D, PEREBEINOS V, AVOURIS P
  • 作者关键词:   graphene, silicon nitride, mobility, band gap, band overlap, pecvd
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984
  • 通讯作者地址:   IBM Corp
  • 被引频次:   101
  • DOI:   10.1021/nl101832y
  • 出版年:   2010

▎ 摘  要

We show that silicon nitride can provide uniform coverage of graphene in field-effect transistors while preserving the channel mobility. This insulator allowed us to study the maximum channel resistance at the Dirac (neutrality) point as a function of the strength of a perpendicular electric field in top-gated devices with different numbers of graphene layers. Using a simple model to account for surface potential variations (electron-hole puddles) near the Dirac Point we estimate the held-induced band gap or band overlap in the different layers.