• 文献标题:   The Resistive Switching Behavior of Al/Chitosan-Graphene Oxide/FTO Structure
  • 文献类型:   Article
  • 作  者:   HO HHD, LE TM, PHAM NK
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF NANOMATERIALS
  • ISSN:   1687-4110 EI 1687-4129
  • 通讯作者地址:  
  • 被引频次:   5
  • DOI:   10.1155/2021/5565169
  • 出版年:   2021

▎ 摘  要

Resistive random access memory (RRAM) is emerging as a new class of nonvolatile memory that offers promising electronic properties and simple metal-insulator-metal (MIM) structures for sandwich layers, such as organics, inorganics, and hybrid materials. Hybrid structures have attracted much interest recently because of their advantageous properties. The combination of chitosan (CS) and graphene oxide (GO) acts as switching layers in the Al/CS-GO/FTO RRAM structure it is studied with bipolar switching behavior at approximately 10(2) ON/OFF ratios during 100 cycles. This hybrid interaction is identified by shifts in the D, G, and 2D bands using Raman spectroscopy. The conduction mechanism is proposed to be a space-charge-limited conduction (SCLC) mechanism and trap-assisted tunneling conduction mechanism in the ON and OFF states, respectively. The trapped and detrapped electrons move through the trap sites with external electric fields, and this movement is responsible for the switching mechanism of the CS-GO nanocomposite memory device.