• 文献标题:   Out of plane stacking of InSe-based heterostructures towards high performance electronic and optoelectronic devices using a graphene electrode
  • 文献类型:   Article
  • 作  者:   GAO W, ZHENG ZQ, LI YT, XIA CX, DU J, ZHAO Y, LI JB
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS CHEMISTRY C
  • ISSN:   2050-7526 EI 2050-7534
  • 通讯作者地址:   Guangdong Univ Technol
  • 被引频次:   6
  • DOI:   10.1039/c8tc04459g
  • 出版年:   2018

▎ 摘  要

Due to their tailored energy band alignments, the integration of two-dimensional materials with out of plane stacking structures provides unprecedented opportunities to fabricate novel electronic and optoelectronic devices. Here, we report the vertical integration of Au-InSe-graphene and graphene-InSe/WSe2-graphene heterostructures to achieve superior properties. The InSe/graphene heterostructure shows a large current density up to 1646 A cm(-2), which makes it a potential candidate for high current flexible devices to enable three dimensional integration. Meanwhile, the graphene-InSe/WSe2-graphene heterostructure exhibits a high rectification ratio of 10(3), a decent responsivity of 83 A W-1, and a superior detectivity of 1.55 x 10(12) Jones, simultaneously. Theoretical calculation indicates that the superior device performance can be attributed to the type II band alignment of InSe and WSe2, which enables efficient separation of photo-generated electron-hole pairs. This study paves the way for the facile fabrication of various functional heterostructures for next-generation electronic and optoelectronic applications.