• 文献标题:   Low-damage high-throughput grazing-angle sputter deposition on graphene
  • 文献类型:   Article
  • 作  者:   CHEN CT, CASU EA, GAJEK M, RAOUX S
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   IBM Thomas J Watson Res Ctr
  • 被引频次:   14
  • DOI:   10.1063/1.4813911
  • 出版年:   2013

▎ 摘  要

Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications. (C) 2013 AIP Publishing LLC.