• 文献标题:   Nanopatterning of Fluorinated Graphene by Electron Beam Irradiation
  • 文献类型:   Article
  • 作  者:   WITHERS F, BOINTON TH, DUBOIS M, RUSSO S, CRACIUN MF
  • 作者关键词:   nanopatterning, fluorinated graphene, electron irradiation, electron transport
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Exeter
  • 被引频次:   136
  • DOI:   10.1021/nl2020697
  • 出版年:   2011

▎ 摘  要

We demonstrate the possibility to selectively reduce insulating fluorinated graphene to conducting and semiconducting graphene by electron beam irradiation. Electron-irradiated fluorinated graphene microstructures show 7 orders of magnitude decrease in resistivity (from 1 T Omega to 100 k Omega), whereas nanostructures show a transport gap in the source drain bias voltage. In this transport gap, electrons are localized, and charge transport is dominated by variable range hopping. Our findings demonstrate a step forward to all-graphene transparent and flexible electronics.