• 文献标题:   Probing residual strain in epitaxial graphene layers on 4H-SiC (000(1)over-bar) with Raman spectroscopy
  • 文献类型:   Article
  • 作  者:   STRUDWICK AJ, CREETH GL, JOHANSSON NAB, MARROWS CH
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Leeds
  • 被引频次:   17
  • DOI:   10.1063/1.3551625
  • 出版年:   2011

▎ 摘  要

Raman microspectroscopy was used to measure compressive strain within epitaxial graphene (EG) grown on the carbon-terminated SiC(000 (1) over bar) face as a function of annealing time for a growth temperature of 1400 degrees C. A maximum strain of -0.5% was seen at the longest time of 55 min. This differs from the -0.9% expected for strain caused by cooling from the growth temperature due to the differential thermal contraction between the SiC and EG layer, despite good agreement between this model and data on EG on SiC (0001). We suggest that this is due to the different EG bonding mechanisms on the two SiC faces. (c) 2011 American Institute of Physics. [doi: 10.1063/1.3551625]