• 文献标题:   Growth and optical characteristics of high-quality ZnO thin films on graphene layers
  • 文献类型:   Article
  • 作  者:   PARK SI, TCHOE Y, BAEK H, HEO J, HYUN JK, JO J, KIM M, KIM NJ, YI GC
  • 作者关键词:  
  • 出版物名称:   APL Materials
  • ISSN:   2166-532X
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   13
  • DOI:   10.1063/1.4905488
  • 出版年:   2015

▎ 摘  要

We report the growth of high-quality, smooth, and flat ZnO thin films on graphene layers and their photoluminescence (PL) characteristics. For the growth of high-quality ZnO thin films on graphene layers, ZnO nanowalls were grown using metalorganic vapor-phase epitaxy on oxygen-plasma treated graphene layers as an intermediate layer. PL measurements were conducted at low temperatures to examine strong near-band-edge emission peaks. The full-width-at-half-maximum value of the dominant PL emission peak was as narrow as 4 meV at T = 11 K, comparable to that of the best-quality films reported previously. Furthermore, the stimulated emission of ZnO thin films on the graphene layers was observed at the low excitation energy of 180 kW/cm(2) at room temperature. Their structural and optical characteristics were investigated using X-ray diffraction, transmission electron microscopy, and PL spectroscopy. (C) 2015 Author(s).