• 文献标题:   Reductive patterning of graphene oxide by vacuum-ultraviolet irradiation in high vacuum
  • 文献类型:   Article
  • 作  者:   TU Y, ICHII T, KHATRI OP, SUGIMURA H
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS EXPRESS
  • ISSN:   1882-0778 EI 1882-0786
  • 通讯作者地址:   Kyoto Univ
  • 被引频次:   8
  • DOI:   10.7567/APEX.7.075101
  • 出版年:   2014

▎ 摘  要

A dry photoprocess for converting graphene oxide (GO) to reduced GO (rGO) by vacuum-ultraviolet (VUV) irradiation is reported. The rapid reduction of GO was achieved by irradiating a GO sheet in vacuum with 172 nm VUV light at a low power density of 10 mW.cm(-2). This VUV reduction photochemistry was successfully applied to photolithography by which rGO lines could be drawn on a GO microsheet at a submicrometer resolution. This method will be promising for the fabrication of graphene-based microdevices. (C) 2014 The Japan Society of Applied Physics