• 文献标题:   Plasmon-gating photoluminescence in graphene/GeSi quantum dots hybrid structures
  • 文献类型:   Article
  • 作  者:   CHEN YL, WU Q, MA YJ, LIU T, FAN YL, YANG XJ, ZHONG ZY, XU F, LU JP, JIANG ZM
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   Fudan Univ
  • 被引频次:   3
  • DOI:   10.1038/srep17688
  • 出版年:   2015

▎ 摘  要

The ability to control light-matter interaction is central to several potential applications in lasing, sensing, and communication. Graphene plasmons provide a way of strongly enhancing the interaction and realizing ultrathin optoelectronic devices. Here, we find that photoluminescence (PL) intensities of the graphene/GeSi quantum dots hybrid structures are saturated and quenched under positive and negative voltages at the excitation of 325 nm, respectively. A mechanism called plasmon-gating effect is proposed to reveal the PL dependence of the hybrid structures on the external electric field. On the contrary, the PL intensities at the excitation of 405 and 795 nm of the hybrid structures are quenched due to the charge transfer by tuning the Fermi level of graphene or the blocking of the excitons recombination by excitons separation effect. The results also provide an evidence for the charge transfer mechanism. The plasmon gating effect on the PL provides a new way to control the optical properties of graphene/QD hybrid structures.