• 文献标题:   Horizontally Aggregation of Monolayer Reduced Graphene Oxide Under Deep UV Irradiation in Solution
  • 文献类型:   Article
  • 作  者:   HE XX, ZHANG SJ, PAN HF, CHEN JQ, XU JH
  • 作者关键词:   uv exfoliation, aggregation of rgo, monolayer, few layer nanographene
  • 出版物名称:   NANOSCALE RESEARCH LETTERS
  • ISSN:   1931-7573 EI 1556-276X
  • 通讯作者地址:   East China Normal Univ
  • 被引频次:   2
  • DOI:   10.1186/s11671-019-2940-z
  • 出版年:   2019

▎ 摘  要

Graphene has been widely used in novel optoelectronic devices in decades. Nowadays, fabrication of large size monolayer graphene with spectral selectivity is highly demanded. Here, we report a simple method for synthesizing large size monolayer graphene with chemical functionalized groups in solution. The few layer nano-graphene can be exfoliated into monolayer nano-graphene under short time UV irradiation in protic solution. The exfoliated monolayer nano-graphene could experience deoxygenation during long time UV exposure. At the same time, the edge of nano-graphene could be activated under deep UV exposure and small size nano-graphene sheets further aggregate horizontally in solution. The size of aggregated rGO increase from 40nm to a maximum of 1m. This approach could be one promising cheap method for synthesizing large size monolayer reduced graphene oxide in the future.