• 文献标题:   Interface States in Bilayer Graphene Encapsulated by Hexagonal Boron Nitride
  • 文献类型:   Article
  • 作  者:   LEE K, LIU ES, WATANABE K, TANIGUCHI T, NAH J
  • 作者关键词:   bilayer graphene, transport gap, band gap, interface state, hexagonal boron nitride
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244
  • 通讯作者地址:   Univ Texas Austin
  • 被引频次:   0
  • DOI:   10.1021/acsami.8b16625
  • 出版年:   2018

▎ 摘  要

The threshold voltages at the onset of conduction for electron and hole branches can provide information on band gap values or interface states in a gap. We measured conductivity of bilayer graphene encapsulated by hexagonal boron nitride as a function of back and top gates, where another bilayer graphene is used as a top gate. From the measured conductivity the transport gap values were extracted assuming zero interface trap states, and they are close to the theoretically expected gap values. From a little discrepancy an average density of interface states per energy within a band gap (D-it) is also estimated. The data clearly show that D-it decreases as a bilayer graphene band gap increases rather than being constant. Despite the decreasing trend of D-it interestingly the total interface states within a gap increases linearly as a band gap increases. This is because of similar to 2x10(10) cm(-2) interface states localized at band edges even without a band gap, and other gap states are equally spread over the gap.