• 文献标题:   Logarithmic temperature dependence of resistivity in CVD graphene
  • 文献类型:   Article
  • 作  者:   TAKEHANA KJ, IMANAKA Y, WATANABE E, OOSATO H, TSUYA DJ, KIM Y, AN KS
  • 作者关键词:   cvd graphene, magnetotransport property, log t dependence of resistivity
  • 出版物名称:   CURRENT APPLIED PHYSICS
  • ISSN:   1567-1739 EI 1878-1675
  • 通讯作者地址:   Natl Inst Mat Sci
  • 被引频次:   3
  • DOI:   10.1016/j.cap.2017.01.002
  • 出版年:   2017

▎ 摘  要

Logarithmical increase of the longitudinal resistivity (p(xx)) between 10 K and 80 K and its saturation at low temperature were observed in the graphene synthesized by the chemical vapor deposition (CVD) with various applied gate voltage. In the two-dimensional system, it is considerably difficult to identify the origin of the logarithmic temperature (Log-T) increase of the resistivity, because there are three corrections to exhibit the Log-T behavior: the weak localization, the electron-electron interaction (EEI) in the disordered system and the Kondo effect. In order to distinguish the origin of the Log-T behavior, we contrived a new method utilizing the magnetotransport property in tilted magnetic fields. As a result, we have assigned the Log-T behavior in the CVD graphene to the correction of the EEI. (C) 2017 Elsevier B.V. All rights reserved.