• 文献标题:   Graphitic N-doped graphene via solution plasma with a single dielectric barrier
  • 文献类型:   Article
  • 作  者:   NIU JQ, CHOKRADJAROEN C, SAITO N
  • 作者关键词:   carbon framework, graphitic nitrogen doped graphene gng, organic solution, single dielectric barrier, solution plasma sp
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1016/j.carbon.2022.08.032 EA AUG 2022
  • 出版年:   2022

▎ 摘  要

Graphitic nitrogen-doped graphene (g-NG) with significantly high nitrogen content, i.e., 18.79 at.%, could be produced by the electrical discharge in liquid, so-called "solution plasma", with a single dielectric barrier. The proposed system could reduce the excessive current, resulting in stabilizing the glow plasma and maintaining the overall temperature. It could promote the preservation of nitrogen atoms from evaporation during the synthesis process and the formation of a graphitic carbon framework. Moreover, the influence of the precursors, i.e., six -membered ring organic molecules with and without the substitution of nitrogen atoms and the nitrogen-based functional groups, was also investigated to provide the guideline for the synthesis of g-NG via this proposed method. The substitution of nitrogen atoms in the benzene ring could be used to synthesize g-NG with higher nitrogen dopants, compared to the benzene ring with only nitrogen-based functional groups.