• 文献标题:   Low vacuum annealing of polymer at low temperatures towards direct and scalable growth of graphene
  • 文献类型:   Article
  • 作  者:   TIWARI RN, TRIPATHI M, YOSHIMURA M, KUMAR A
  • 作者关键词:   graphene, thermal annealing, polymer
  • 出版物名称:   MATERIALS RESEARCH BULLETIN
  • ISSN:   0025-5408 EI 1873-4227
  • 通讯作者地址:   Mahatma Gandhi Cent Univ
  • 被引频次:   1
  • DOI:   10.1016/j.materresbull.2018.06.031
  • 出版年:   2018

▎ 摘  要

A transfer-free method is demonstrated for the synthesis of graphene flakes directly on insulating substrate (SiO2/Si) by carbon decomposition and diffusion through a layer of nickel. The 100 nm nickel catalyst was deposited on the top of SiO2 (300 nm)/Si substrate. The sandwich structure was prepared wherein spin-coated polymer was used as a carbon source for the graphene formation. The carbon molecules decomposed and diffused into the nickel layer during annealing of sandwich structures in low vacuum (similar to 5 x 10(-1) Pa) at 600-750 degrees C for 10 min. When cooled to room temperature (25 degrees C), graphene is formed at the interface between Ni and SiO2/Si, the nickel film was removed by chemical etching. The observed graphene on SiO2/Si substrates is confirmed by optical microscopy, Raman spectroscopy and atomic force microscopy. The Raman spectroscopy mapping over a 55 x 55 mu m(2) area confirmed the good quality of graphene flakes obtained.