• 文献标题:   Quantitative Assessment of Friction Characteristics of Single-Layer MoS2 and Graphene Using Atomic Force Microscopy
  • 文献类型:   Article
  • 作  者:   KHAC BCT, CHUNG KH
  • 作者关键词:   atomic force microscopy, friction, graphene, mos2
  • 出版物名称:   JOURNAL OF NANOSCIENCE NANOTECHNOLOGY
  • ISSN:   1533-4880 EI 1533-4899
  • 通讯作者地址:   Univ Ulsan
  • 被引频次:   3
  • DOI:   10.1166/jnn.2016.11004
  • 出版年:   2016

▎ 摘  要

Atomically thin layered materials such as MoS2 and graphene have attracted a lot of interest as protective coating layers for micro- and nano-electromechanical devices based on their superior mechanical properties and chemical inertness. In this work, the frictional characteristics of single layer MoS2 and graphene prepared by the mechanical exfoliation method were quantitatively investigated using atomic force microscopy. The results showed that both MoS2 and graphene exhibited relatively low friction forces of 1 similar to 3 nN under normal forces ranging from 1 to 30 nN. However, a higher increase in the friction force as the normal force increased was observed in the case of MoS2. The differences in the adhesion characteristics and mechanical properties of atomically thin layered materials may influence the puckering of the layer, which in turn influences the frictional behavior.