• 文献标题:   Subsurface channeling of keV ions between graphene layers: Molecular dynamics simulation
  • 文献类型:   Article
  • 作  者:   ROSANDI Y, NIETIADI ML, URBASSEK HM
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   1098-0121 EI 1550-235X
  • 通讯作者地址:   Univ Kaiserslautern
  • 被引频次:   3
  • DOI:   10.1103/PhysRevB.91.125441
  • 出版年:   2015

▎ 摘  要

Using molecular dynamics simulation, we study the impact of 3 keV Xe ions at glancing incidence on a beta-SiC (111) surface covered by graphene. On top of a full graphene layer covering the substrate, we add a graphene half-layer; the step forming where the half-layer terminates allows the entrance of glancing-incidence ions into a subsurface channel between graphene layers. We find a high channeling probability which leads to only little sputtering and damage formation. Typically, vacancy defects are formed at periodic intervals when the ion hits the uppermost graphene layer from below. Extended damage occurs when the ion hits the step edge itself. There we find several kinds of defects varying from adatoms over the formation of sp(1)-bonded chains to hillocks.