• 文献标题:   The Preparation of BN-Doped Atomic Layer Graphene via Plasma Treatment and Thermal Annealing
  • 文献类型:   Article
  • 作  者:   XU J, JANG SK, LEE J, SONG YJ, LEE S
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447
  • 通讯作者地址:   Sungkyunkwan Univ SKKU
  • 被引频次:   15
  • DOI:   10.1021/jp504773h
  • 出版年:   2014

▎ 摘  要

We report a new method for the codoping of boron and nitrogen in a monolayer graphene film. After the CVD synthesis of monolayer graphene, BN-doped graphene is prepared by performing power-controlled plasma treatment and thermal annealing with borazine. BN-doped graphene films with various doping levels, which were controlled by altering the plasma treatment power, were found with Raman and electrical measurements to investigate exhibit p-doping behavior. Transmission electron microscopy, electron energy loss spectroscopy, and X-ray photoelectron spectroscopy were used to demonstrate that the synthesized BN-doped graphene films have a sp(2) hybridized hexagonal structure. This approach to tuning the distribution and doping levels of boron and nitrogen in monolayer sp(2) hybridized BN-doped graphene is expected to be very useful for applications requiring large-area graphene with an opened band gap.