• 文献标题:   Graphene quantum dot implanted supramolecular carbon nitrides with robust photocatalytic activity against recalcitrant contaminants
  • 文献类型:   Article
  • 作  者:   HUO Y, DING XH, ZHANG XY, REN M, SANG LB, WEN SY, SONG DY, YANG YX
  • 作者关键词:  
  • 出版物名称:   CATALYSIS SCIENCE TECHNOLOGY
  • ISSN:   2044-4753 EI 2044-4761
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1039/d2cy00605g EA APR 2022
  • 出版年:   2022

▎ 摘  要

For the purpose of improving the photocatalytic oxidation performance of graphitic carbon nitride (g-C3N4) towards recalcitrant organic pollutants, graphene quantum dot implanted supramolecular carbon nitrides (AGSCNs) with an open layered nanostructure are prepared via a supramolecular self-assembly method combined with thermal polymerization. At a suitable addition amount of amino-functionalized graphene quantum dots (AGQDs), AGSCN(0.3) displays many more merits, such as a large BET surface area, rapid charge separation efficiency, and more positive valence band edge potential. The above values enable AGSCN(0.3) to exhibit outstanding visible-light photocatalytic capability for the degradation of p-nitrophenol (PNP), levofloxacin (LEVO), and atenolol (ATN) in water, which is 1.8, 2.1, and 1.3 times faster than that of supramolecular g-C3N4 (SCN), and 4.1, 3.9 and 2.2 times faster than that of bulk g-C3N4 (BCN), respectively. Combining photoelectrochemical measurements and free radical capture technology, the mechanism by which AGQDs improve the photocatalytic oxidation capability of AGSCN towards organic pollutants is studied in-depth. The design of AGSCN photocatalysts may provide an effective way to develop metal-free photocatalytic technology for sustainable development.