• 文献标题:   Scattering by flexural phonons in suspended graphene under back gate induced strain
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   OCHOA H, CASTRO EV, KATSNELSON MI, GUINEA F
  • 作者关键词:   graphene, phonon, strain, resistivity
  • 出版物名称:   PHYSICA ELOWDIMENSIONAL SYSTEMS NANOSTRUCTURES
  • ISSN:   1386-9477
  • 通讯作者地址:   CSIC
  • 被引频次:   30
  • DOI:   10.1016/j.physe.2011.03.017
  • 出版年:   2012

▎ 摘  要

We have studied electron scattering by out-of-plane (flexural) phonon modes in doped suspended graphene and its effect on charge transport. In the free-standing case (absence of strain) the flexural branch shows a quadratic dispersion relation, which becomes linear at long-wavelengths when the sample is under tension due to the rotational symmetry breaking. In the non-strained case, scattering by flexural phonons is the main limitation to electron mobility. This picture changes drastically when strains above (u) over bar = 10(-4),n(10(12) cm(-2)) are considered. Here we study in particular the case of back gate induced strain, and apply our theoretical findings to recent experiments in suspended graphene. (C) 2011 Elsevier B.V. All rights reserved.