• 文献标题:   Nano-graphene structures deposited by N-IR pulsed laser ablation of graphite on Si
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   CAPPELLI E, ORLANDO S, SERVIDORI M, SCILLETTA C
  • 作者关键词:   oriented nanographene growth, nir pld, carbon film, grazing incidence xrd, film density, xray reflectivity
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332
  • 通讯作者地址:   CNR
  • 被引频次:   28
  • DOI:   10.1016/j.apsusc.2007.09.098
  • 出版年:   2007

▎ 摘  要

Thin nano-structured carbon films have been deposited in vacuum by pulsed laser ablation, from a rotating polycrystalline graphite target, on Si (1 0 0) substrates, kept at temperatures ranging from RT to 800 degrees C. The laser ablation was performed by a Nd:YAG laser, operating in the near IR (lambda = 1064 nm). X-ray diffraction analysis, performed at grazing incidence angle, both in-plane (ip-gid) and out-of-plane (op-gid), has shown the growth of oriented nano-sized graphene particles, characterised by high inter-planar stacking distance (d(c) similar to 0.39 nm), compared to graphite. The film structure and texturing are strongly related both to laser wavelength and substrate temperature: the low energy associated to the IR laser radiation (1.17 eV) generates activated carbon species of large dimensions that, also at low T (similar to 400 degrees C), easy evolve toward more stable sp(2) aromatic bonds, in the plume direction. Increasing temperature the nano-structure formation increases, causing a further aggregation of aromatic planes, voids formation, and a related density (by X-ray reflectivity) drop to very low values. SEM and STM show for these samples a strongly increased macroscopic roughness. The whole process, mainly at higher temperatures, is characterised by a fast kinetic mode, far from equilibrium and without any structural or spatial rearrangement. (C) 2007 Elsevier B.V. All rights reserved.