• 文献标题:   Low temperature reduction of graphene oxide film by ammonia solution and its application for high-performance supercapacitors
  • 文献类型:   Article
  • 作  者:   ZHU YF, HUANG HF, ZHOU WZ, LI GX, LIANG XQ, GUO J, TANG SL
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS SCIENCEMATERIALS IN ELECTRONICS
  • ISSN:   0957-4522 EI 1573-482X
  • 通讯作者地址:   Guangxi Univ
  • 被引频次:   4
  • DOI:   10.1007/s10854-017-6771-3
  • 出版年:   2017

▎ 摘  要

Here we demonstrate that graphene oxide (GO) film on Ni foam can be doped with nitrogen atoms and reduced directly at a lower temperature of 90 A degrees C using ammonia solution as reducing agent and nitrogen source. The reduction and nitrogen doping of GO occur simultaneously when GO film on Ni foam is immersed into ammonia solution. The nitrogen doping can be realised and the content of N in graphene film turns out to be rather good as high as 3.60%. When used as binder-free electrode, the resulting graphene film on Ni foam delivers a gravimetric capacitance of 230 F g(-1). It also exhibites relatively an outstanding rate capability of 164 F g(-1) at 83.3 A g(-1) and better cycle stability that capacitance retention maintains at 96.7% of its initial capacitance capacitance after 2000 cycles. The method also provides a universal route for preparing a binder-free graphene-based electrode.