• 文献标题:   Effect of Hydrogen in Size-Limited Growth of Graphene by Atmospheric Pressure Chemical Vapor Deposition
  • 文献类型:   Article
  • 作  者:   ZHANG HR, ZHANG YH, WANG B, CHEN ZY, SUI YP, ZHANG YQ, TANG CM, ZHU B, XIE XM, YU GH, JIN Z, LIU XY
  • 作者关键词:   graphene, cvd, hydrogen, growth rate, domain size
  • 出版物名称:   JOURNAL OF ELECTRONIC MATERIALS
  • ISSN:   0361-5235 EI 1543-186X
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   8
  • DOI:   10.1007/s11664-014-3415-8
  • 出版年:   2015

▎ 摘  要

Analysis of graphene domain synthesis explains the main graphene growth process. Size-limited graphene growth caused by hydrogen is studied to achieve efficient graphene synthesis. Graphene synthesis on Cu foils via the chemical vapor deposition method using methane as carbon source is limited by high hydrogen concentration. Results indicate that hydrogen affects graphene nucleation, the growth rate, and the final domain size. Considering the role of hydrogen as both activator and etching reagent, we build a model to explain the cause of this low graphene growth rate for high hydrogen partial pressure. A two-step method is proposed to control the graphene nucleation and growth rate separately. Half the time is required to obtain similar domain size compared with single-step synthesis, indicating improved graphene synthesis efficiency. The change of the partial pressure and transmission time between the two steps is a factor that cannot be ignored to control the graphene growth.