• 文献标题:   Intrinsic Disorder in Graphene on Transition Metal Dichalcogenide Heterostructures
  • 文献类型:   Article
  • 作  者:   YANKOWITZ M, LARENTIS S, KIM K, XUE JM, MCKENZIE D, HUANG SQ, PAGGEN M, ALI MN, CAVA RJ, TUTUC E, LEROY BJ
  • 作者关键词:   scanning tunneling microscopy/spectroscopy, graphene, transition metal dichalehogenide, defect, scattering
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Arizona
  • 被引频次:   27
  • DOI:   10.1021/nl5047736
  • 出版年:   2015

▎ 摘  要

Semiconducting transition metal clichalchogenides (TMD) are a family of van der Waals bonded materials that have recently received interest as alternative substrates to hexagonal boron nitride (hBN) for graphene, as well as for components in novel graphene-based device heterostructures. We elucidate the local structural,and electronic properties of graphene On TMD heterostructures through scanning tunneling microscopy and spectroscopy measurements. We find that crystalline defects intrinsic to TMDs induce substantial electronic scattering and charge carrier density fluctuations in the graphene. These signatures of local disorder explain the significant degradation of graphene device mobilities using TMD substrates, particularly compared to similar graphene on hBN devices.