• 文献标题:   Vth Shift in Single-Layer Graphene Field-Effect Transistors and Its Correlation With Raman Inspection
  • 文献类型:   Article
  • 作  者:   LIU WJ, SUN XW, TRAN XA, FANG Z, WANG ZR, WANG F, WU L, ZHANG JF, WEI J, ZHU HL, YU HY
  • 作者关键词:   graphene fieldeffect transistors gfets, negative bias temperature instability nbti, positive bias temperature instability pbti, raman
  • 出版物名称:   IEEE TRANSACTIONS ON DEVICE MATERIALS RELIABILITY
  • ISSN:   1530-4388 EI 1558-2574
  • 通讯作者地址:   S Univ Sci Technol China
  • 被引频次:   11
  • DOI:   10.1109/TDMR.2012.2190414
  • 出版年:   2012

▎ 摘  要

Raman measurement is carried out to understand Vth shift in single-layer graphene field-effect transistors (GFETs). The G (2D) peak shift in Raman spectra is correlated to the corresponding Delta Vth during stress and recovery phases. A blue (red) shift of G and 2D peaks is seen during stress (recovery) phase, indicating the corresponding trapping (detrapping) effects in the graphene device. It is interesting to note that, after forming gas annealing (H-2/Ar), the defects can be generated in graphene (evidenced by D peak of Raman spectra), leading to the increased Delta Vth for both negative bias temperature instability and positive bias temperature instability in single-layer GFETs.