• 文献标题:   Extremely Large Gate Modulation in Vertical Graphene/WSe2 Heterojunction Barristor Based on a Novel Transport Mechanism
  • 文献类型:   Article
  • 作  者:   SHIM J, KIM HS, SHIM YS, KANG DH, PARK HY, LEE J, JEON J, JUNG SJ, SONG YJ, JUNG WS, LEE J, PARK S, KIM J, LEE S, KIM YH, PARK JH
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   Sungkyunkwan Univ
  • 被引频次:   42
  • DOI:   10.1002/adma.201506004
  • 出版年:   2016

▎ 摘  要

A WSe2-based vertical graphene-transition metal dichalcogenide heterojunction barristor shows an unprecedented on-current increase with decreasing temperature and an extremely high on/off-current ratio of 5 x 10(7) at 180 K (3 x 10(4) at room temperature). These features originate from a trap-assisted tunneling process involving WSe2 defect states aligned near the graphene Dirac point.