▎ 摘　　要

The great potential of graphene can be enhanced thanks to the functionalization of its surface. For this aim, different thicknesses of TiO2 were grown on graphene films by atomic layer deposition (ALD) at 200 degrees C using H2O and TiCl4 as precursors. The changes in electronic structure of graphene after the deposition of TiO2 and the influence of graphene in TiO2 photocatalytic activity under UV-Visible irradiation were studied. Results indicated the presence of inhomogeneity and intrinsic strain effects within the same sample. Undecorated graphene showed pre-existent strain due to the mismatch between graphene film and the underlying substrate, while non-intentional self-doping is caused by the presence of charged impurities. The deposition of TiO2 films with thickness