• 文献标题:   Controlled oxidative functionalization of monolayer graphene by water-vapor plasma etching
  • 文献类型:   Article
  • 作  者:   LIU L, XIE DL, WU MH, YANG XX, XU Z, WANG WL, BAI XD, WANG EG
  • 作者关键词:  
  • 出版物名称:   CARBON
  • ISSN:   0008-6223
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   19
  • DOI:   10.1016/j.carbon.2012.02.090
  • 出版年:   2012

▎ 摘  要

We report studies on the controlled step-by-step oxidative functionalization of monolayer graphene by chemically reactive water-vapor plasma dry etching. The use of a porous mask on top of the graphene sheets as a filter is essential to reduce the density of free radicals and weaken the sputtering effect. Micro-Raman spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy showed that the oxidation occurred in a mild and controllable way, and that a wide variety of oxygen-containing functional groups can be evenly and incrementally incorporated onto the carbon lattice. By monitoring the electrical property changes in the graphene at different levels of oxidation, we observed a transformation of the electrical conduction process from continuum percolation to variable range hopping and/or electric-field-driven tunneling, due to the progressive increase of sp(3)-based basal plane distortion that disrupts the transport of carriers delocalized in the sp(2) carbon network. (C) 2012 Elsevier Ltd. All rights reserved.