• 文献标题:   All-Graphene Planar Double Barrier Resonant Tunneling Diodes
  • 文献类型:   Article
  • 作  者:   ALDIRINI F, HOSSAIN FM, NIRMALATHAS A, SKAFIDAS E
  • 作者关键词:   double barrier, extended huckel, graphene, planar diode, resonant tunneling, rectifier, ndr, negf
  • 出版物名称:   IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
  • ISSN:   2168-6734
  • 通讯作者地址:   Univ Melbourne
  • 被引频次:   12
  • DOI:   10.1109/JEDS.2014.2327375
  • 出版年:   2014

▎ 摘  要

In this work, we propose an atomically-thin all-graphene planar double barrier resonant tunneling diode that can be realized within a single graphene nanoribbon. The proposed device does not require any doping or external gating and can be fabricated using minimal process steps. The planar architecture of the device allows a simple in-plane connection of multiple devices in parallel without any extra processing steps during fabrication, enhancing the current driving capabilities of the device. Quantum mechanical simulation results, based on non-equilibrium Green's function formalism and the extended Huckel method, show promising device performance with a high reverse-to-forward current rectification ratio exceeding 50 000, and confirm the presence of negative differential resistance within the device's current-voltage characteristics.