• 文献标题:   Charge Relaxation Resistances in Gated Graphene Nanoribbons
  • 文献类型:   Article
  • 作  者:   SHI YJ, LAN J, YE EJ, SUI WQ, ZHAO XA
  • 作者关键词:   ac transport, charge relaxation resistance, graphene nanoribbon fet gnrfet, scattering theory
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   Zhejiang Univ
  • 被引频次:   0
  • DOI:   10.1109/TED.2015.2453272
  • 出版年:   2015

▎ 摘  要

We investigate the charge relaxation resistances in a typical graphene nanoribbon FET (GNRFET). We show that the behavior of the charge relaxation resistances heavily depends on the exerted gate voltage and the structural details of the GNRFET. When there is 0 channel (blocked), 1 channel, and N channels in the GNR as tuned by the gate voltage, the equilibrium charge relaxation resistance is roughly 1, 1/2, and 1/2N of Sharvin-Imry contact resistance (h/2e(2)), respectively, whereas the nonequilibrium charge relaxation resistance is much smaller. Our results indicate that the charge relaxation resistances characterizing the information of dissipation, RC time and noise can be controlled by the gate voltage.