• 文献标题:   The origins and limits of metal-graphene junction resistance
  • 文献类型:   Article
  • 作  者:   XIA FN, PEREBEINOS V, LIN YM, WU YQ, AVOURIS P
  • 作者关键词:  
  • 出版物名称:   NATURE NANOTECHNOLOGY
  • ISSN:   1748-3387 EI 1748-3395
  • 通讯作者地址:   IBM Thomas J Watson Res Ctr
  • 被引频次:   538
  • DOI:   10.1038/NNANO.2011.6
  • 出版年:   2011

▎ 摘  要

A high-quality junction between graphene and metallic contacts is crucial in the creation of high-performance graphene transistors. In an ideal metal-graphene junction, the contact resistance is determined solely by the number of conduction modes in graphene. However, as yet, measurements of contact resistance have been inconsistent, and the factors that determine the contact resistance remain unclear. Here, we report that the contact resistance in a palladium-graphene junction exhibits an anomalous temperature dependence, dropping significantly as temperature decreases to a value of just 110 +/- 20 Omega mu m at 6 K, which is two to three times the minimum achievable resistance. Using a combination of experiment and theory we show that this behaviour results from carrier transport in graphene under the palladium contact. At low temperature, the carrier mean free path exceeds the palladium-graphene coupling length, leading to nearly ballistic transport with a transfer efficiency of similar to 75%. As the temperature increases, this carrier transport becomes less ballistic, resulting in a considerable reduction in efficiency.