• 文献标题:   Observation of Oscillatory Resistance Behavior in Coupled Bernal and Rhombohedral Stacking Graphene
  • 文献类型:   Article
  • 作  者:   LIU YP, LEW WS, GOOLAUP S, LIEW HF, WONG SK, ZHOU TJ
  • 作者关键词:   graphene, oscillatory resistance, coulomb interaction, shortrange scattering, bernal rhombohedral stacking, excitonic gap, thermally activated
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Nanyang Technol Univ
  • 被引频次:   14
  • DOI:   10.1021/nn200771e
  • 出版年:   2011

▎ 摘  要

We report on the first observation of an anomalous temperature-dependent resistance behavior in coupled Bernal and rhombohedral stacking graphene. At low-temperature regime (<50 K) the temperature-dependent resistance exhibits a drop while at high-temperature regions (>250 K), the resistance increases. In the transition region (50-250 K) an oscillatory resistance behavior was observed. This property is not present In any layered graphene structures other than five-layer. We propose that the temperature-dependent resistance behavior is governed by the interplay of the Coulomb and short-range scatterings. The origin of the oscillatory resistance behavior is the ABCAB and ABABA stacking configurations, which Induces tunable bandgap in the five-layer graphene. The obtained results also indicate that a perpendicular magnetic field opens an excitonic gap because of the Coulomb interaction-driven electronic instabilities, and the bandgap of the five-layer graphene is thermally activated. Potentially, the observed phenomenon provides important transport information to the design of few-layer graphene transistors that can be manipulated by a magnetic field.