• 文献标题:   Spatial distribution of structural and morphological features of few layered intercalated graphene
  • 文献类型:   Article
  • 作  者:   CHANDRA B, FRANCIS MK, BHARGAV PB, AHMED N, KESARI S, RAO R, ANTONYSAMY AJ
  • 作者关键词:   graphene, cvd, intercalation, raman spectroscopy, fesem, xps
  • 出版物名称:   OPTOELECTRONICS ADVANCED MATERIALSRAPID COMMUNICATIONS
  • ISSN:   1842-6573 EI 2065-3824
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:  
  • 出版年:   2021

▎ 摘  要

Few layered graphene (FLG) is grown using chemical vapor deposition (CVD) technique using copper (Cu) as a catalyst. Structural and morphological features of graphene layers grown for different time periods are examined using maps of various Raman intensity ratios, X-ray photoemission spectroscopy (XPS) spectrum and field emission scanning electron microscopy (FESEM) images. Average distance between defects in the grown graphene is calculated to range from 28 nm to 19 nm. Oxygen to carbon ratio in the grown graphene is estimated to be 0.18. Properties of FLG intercalated with FeCl3 are also studied.