• 文献标题:   Electrical transport properties of polycrystalline CVD graphene on SiO2/Si substrate
  • 文献类型:   Article
  • 作  者:   KUMARI A, PRASAD N, BHATNAGAR PK, MATHUR PC, YADAV AK, TOMY CV, BHATIA CS
  • 作者关键词:   graphene, chemical vapor deposition, grain boundary characterization, electrical propertie
  • 出版物名称:   DIAMOND RELATED MATERIALS
  • ISSN:   0925-9635 EI 1879-0062
  • 通讯作者地址:   Univ Delhi
  • 被引频次:   15
  • DOI:   10.1016/j.diamond.2014.03.003
  • 出版年:   2014

▎ 摘  要

Transport behavior of single layer graphene (SLG) grown by chemical vapor deposition technique on copper foil and transferred to SiO2/Si substrate has been studied by measuring the dc conductivity and Hall mobility in the temperature range 2-460 K. The samples of size 1 x 1 cm(2) have been found to be polycrystalline in nature. Raman spectrum has been studied at various locations of the sample and the formation of SLG has been confirmed. From dc conductivity and mobility measurements it has been concluded that the one dimensional grain boundary defects are mainly responsible for the deterioration of mobility and conductivity of charge carriers in the polycrystalline samples. (C) 2014 Elsevier B.V. All rights reserved.