• 文献标题:   Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
  • 文献类型:   Article, Early Access
  • 作  者:   LIN ZZ, WANG Z, ZHANG X, DIAO DF
  • 作者关键词:   covid19, graphene nanosheet, superhydrophobic, photosterilize
  • 出版物名称:   NANO RESEARCH
  • ISSN:   1998-0124 EI 1998-0000
  • 通讯作者地址:   Shenzhen Univ
  • 被引频次:   0
  • DOI:   10.1007/s12274-020-3158-1 EA NOV 2020
  • 出版年:  

▎ 摘  要

The 2019 Coronavirus disease (COVID-19) has affected more than 200 countries. Wearing masks can effectively cut off the virus spreading route since the coronavirus is mainly spreading by respiratory droplets. However, the common surgical masks cannot be reused, resulting in the increasing economic and resource consumption around the world. Herein, we report a superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film, with high-density edges of standing structured graphene nanosheets. The GNEC mask exhibits an excellent hydrophobic ability (water contact angle: 157.9 degrees) and an outstanding filtration efficiency with 100% bacterial filtration efficiency (BFE). In addition, the GNEC mask shows the prominent photo-sterilize performance, heating up to 110 degrees C quickly under the solar illumination. These high performances may facilitate the combat against the COVID-19 outbreaks, while the reusable masks help reducing the economic and resource consumption.