• 文献标题:   Uniform high current and current density field emission from the chiseled edge of a vertically aligned graphene-based thin film
  • 文献类型:   Article
  • 作  者:   BAEK IK, BHATTACHARYA R, LEE JS, KIM S, HONG D, SATTOROV MA, MIN SH, KIM YH, PARK GS
  • 作者关键词:   reduced graphene oxide rgo, mechanical shaping, field emitter, emission uniformity, emission stability
  • 出版物名称:   JOURNAL OF ELECTROMAGNETIC WAVES APPLICATIONS
  • ISSN:   0920-5071 EI 1569-3937
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   2
  • DOI:   10.1080/09205071.2017.1345658
  • 出版年:   2017

▎ 摘  要

The field emission properties of the controlled emission edge of a vertically aligned graphene-based thin film are presented. A current and current density of above 7 mA and 200 A/cm(2), respectively, with uniform electron emission, are achieved. Uniform high current and current density emissions can be realized by the pre-mechanical shaping and post electrical conditioning of reduced graphene oxide (rGO) film emission, owing to the robustness, thinness (<1 mu m), and well-defined uniform film thickness. Field emission luminance demonstrates uniform emission over the entire emission area with a high aspect ratio. Along with a high current emission, the rGO film exhibits excellent emission stability, long-term. This offers prospects for various applications in field emission displays, electron microscopy, and particularly for the realization of miniaturized terahertz vacuum electronic devices, which require electron sources with uniform high currents and current densities, such as long-lifetime cold cathodes.