• 文献标题:   Modeling of a vertical tunneling graphene heterojunction field-effect transistor
  • 文献类型:   Article
  • 作  者:   KUMAR SB, SEOL G, GUO J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Florida
  • 被引频次:   32
  • DOI:   10.1063/1.4737394
  • 出版年:   2012

▎ 摘  要

Vertical tunneling field-effect-transistor (FET) based on graphene heterojunctions with layers of hBN is simulated by self-consistent quantum transport simulations. It is found that the asymmetric p-type and n-type conduction is due to work function difference between the graphene contact and the tunneling channel material. Modulation of the bottom-graphene-contact plays an important role in determining the switching characteristic of the device. Due to the electrostatic short-channel-effects stemming from the vertical-FET structure, the output I-V characteristics do not saturate. The scaling behaviors the vertical-FET as a function of the gate insulator thickness and the thickness of the tunneling channel material are examined. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4737394]