• 文献标题:   Gas phase controlled deposition of high quality large-area graphene films
  • 文献类型:   Article
  • 作  者:   KUMAR S, MCEVOY N, LUTZ T, KEELEY GP, NICOLOSI V, MURRAY CP, BLAU WJ, DUESBERG GS
  • 作者关键词:  
  • 出版物名称:   CHEMICAL COMMUNICATIONS
  • ISSN:   1359-7345 EI 1364-548X
  • 通讯作者地址:   CRANN
  • 被引频次:   37
  • DOI:   10.1039/b919725g
  • 出版年:   2010

▎ 摘  要

A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 degrees C.