• 文献标题:   Hybrid cold and hot-wall reaction chamber for the rapid synthesis of uniform graphene
  • 文献类型:   Article
  • 作  者:   ARJMANDITASH H, LEBEDEV N, VAN DEURSEN PMG, AARTS J, SCHNEIDER GF
  • 作者关键词:  
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:   Leiden Univ
  • 被引频次:   1
  • DOI:   10.1016/j.carbon.2017.03.014
  • 出版年:   2017

▎ 摘  要

We introduce a novel modality in the CVD growth of graphene which combines cold-wall and hot-wall reaction chambers. This hybrid mode preserves the advantages of a cold-wall chamber such as fast growth and low power consumption, while boosting the quality of growth, similar now to conventional CVD with in hot-wall chambers. The synthesized graphene forms a uniform monolayer. Electronic transport measurements indicate significant improvement in charge carrier mobility compared to graphene synthesized in a cold-wall reaction chamber. Our results promise the development of a fast and cost-efficient growth of high quality graphene, suitable for scalable industrial applications. (C) 2017 The Authors. Published by Elsevier Ltd.