• 文献标题:   Nanostructured Few-Layer Graphene with Superior Optical Limiting Properties Fabricated by a Catalytic Steam Etching Process
  • 文献类型:   Article
  • 作  者:   SUN ZY, DONG NN, XIE KP, XIA W, KONIG D, NAGAIAH TC, SANCHEZ MD, EBBINGHAUS P, ERBE A, ZHANG XY, LUDWIG A, SCHUHMANN W, WANG J, MUHLER M
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   21
  • DOI:   10.1021/jp401736n
  • 出版年:   2013

▎ 摘  要

Tailoring the morphology and structure of graphene can result in novel properties for advanced applications. Here, we demonstrate the fabrication of nanostructured few-layer graphene through a mild etching process via catalytic steam gasification of carbon by Fe nanoparticles (NPs). Controlling the reaction temperature, steam concentration, and the loading density of the NPs enables the fine-tuning of the etching level of graphene. Well-defined nanotrenches with a width of less than 25 nm were formed by channeling of the catalytic NPs. Etching caves and quasi-semicircular etched edges were observed as well. The nonlinear optical properties of the resulting nanostructured graphene were studied under a 532 nm nanosecond pulse laser through an open-aperture apparatus. At the same level of the linear extinction coefficient, it exhibits superior optical limiting performance in comparison with pristine graphene and C-60, showing a large potential in nanophotonic devices. This enhancement is ascribed to the defects formed by etching resulting in a finite band gap in nanostructured graphene.