▎ 摘　　要

To unleash the full potential of graphene in electronics and optoelectronics, high-quality graphene patterns on insulating substrates are required. However, existing methods generally follow a "synthesis + patterning'' strategy, which are time consuming and costly for fabricating high-quality graphene patterns on desired substrates. We developed a nanofabrication process to deposit high-quality graphene patterns directly on insulating substrates via a solid-phase laser direct writing (LDW) process. Open-air and room-temperature fabrication of graphene patterns on insulating substrates has been achieved via a femtosecond LDW process without graphene transfer and patterning. Various graphene patterns, including texts, spirals, line arrays, and integrated circuit patterns, with a feature line width of 800 nm and a low sheet resistance of 205 ohm/sq, were fabricated. The LDW method provides a facile and cost-effective way to fabricate complex and high-quality graphene patterns directly on target substrates, which opens a door for fabricating various advanced functional devices.