• 文献标题:   Band Engineering of Large-Twist-Angle Graphene/h-BN Moire Superlattices with Pressure
  • 文献类型:   Article
  • 作  者:   GAO Y, LIN XQ, SMART T, CI PH, WATANABE K, TANIGUCHI T, JEANLOZ R, NI J, WU JQ
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW LETTERS
  • ISSN:   0031-9007 EI 1079-7114
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   0
  • DOI:   10.1103/PhysRevLett.125.226403
  • 出版年:   2020

▎ 摘  要

Graphene interfacing hexagonal boron nitride (h-BN) forms lateral moire superlattices that host a wide range of new physical effects such as the creation of secondary Dirac points and band gap opening. A delicate control of the twist angle between the two layers is required as the effects weaken or disappear at large twist angles. In this Letter, we show that these effects can be reinstated in large-angle (similar to 1.8 degrees) graphene/h-BN moire superlattices under high pressures. A graphene/h-BN moire superlattice microdevice is fabricated directly on the diamond culet of a diamond anvil cell, where pressure up to 8.3 GPa is applied. The band gap at the primary Dirac point is opened by 40-60 meV, and fingerprints of the second Dirac band gap are also observed in the valence band. Theoretical calculations confirm the band engineering with pressure in large-angle graphene/h-BN bilayers.