• 文献标题:   A Physical Model of Contact Resistance in Ti-Contacted Graphene-Based Field Effect Transistors
  • 文献类型:   Article
  • 作  者:   WANG B, MALIK MW, YAN YY, KILCHYTSKA V, ZENG Y, FLANDRE D, RASKIN JP
  • 作者关键词:   contact resistance, graphene, interfacial layer, model
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:  
  • 被引频次:   3
  • DOI:   10.1109/TED.2020.3046166
  • 出版年:   2021

▎ 摘  要

The effect of device fabrication processing conditions is often overlooked in the evaluation of the contact resistance in metal-graphene contact. In this work, we investigate the Ti-graphene contact resistance theoretically and experimentally. A compact model has been proposed to reveal and evaluate the role of different factors in controlling the value of contact resistance. A layer of oxidized Ti or polymer residues at the Ti-graphene interface has been considered to explain the reduced carrier transmission probability through the interface. Experimental results report a low contact resistance as small as 271.45 Omega center dot mu m and our model agrees with the measured values. The proposed model explains the large variation of the contact resistance reported in the literature up to date and help to improvemetal-graphene contact for future applications.