• 文献标题:   Vertical and In-Plane Current Devices Using NbS2/n-MoS2 van der Waals Schottky Junction and Graphene Contact
  • 文献类型:   Article
  • 作  者:   SHIN HG, YOON HS, KIM JS, KIM M, LIM JY, YU S, PARK H, YI Y, KIM T, JUN SC, IM S
  • 作者关键词:   mos2, nbs2, graphene, schottky diode, mesfet, van der waals interface
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Yonsei Univ
  • 被引频次:   20
  • DOI:   10.1021/acs.nanolett.7b05338
  • 出版年:   2018

▎ 摘  要

A van der Waals (vdW) Schottky junction between two-dimensional (2D) transition metal dichalcogenides (TMDs) is introduced here for both vertical and in-plane current devices: Schottky diodes and metal semiconductor field-effect transistors (MESFETs). The Schottky barrier between conducting NbS2 and semiconducting n-MoS2 appeared to be as large as 0.5 eV due to their work function difference. While the Schottky diode shows an ideality factor of 1.8-4.0 with an on-to-off current ratio of 10(3)-10(5), Schottky-effect MESFET displays little gate hysteresis and an ideal subthreshold swing of 60-80 mV/dec due to low-density traps at the vdW interface. All MESFETs operate with a low threshold gate voltage of 0.5 similar to -1 V, exhibiting easy saturation. It was also found that the device mobility is significantly dependent on the condition of source/drain (S/D) contact for n-channel MoS2. The highest room temperature mobility in MESFET reaches to approximately more than 800 cm(2)/V s with graphene S/D contact. The NbS2/n-MoS2 MESFET with graphene was successfully integrated into an organic piezoelectric touch sensor circuit with green OLED indicator, exploiting its predictable small threshold voltage, while NbS2/n-MoS2 Schottky diodes with graphene were applied to extract doping concentrations in MoS2 channel.