• 文献标题:   Theoretical study on role of edge termination for growth direction selectivity in chemical vapor deposition of hBN/graphene heterostructure on Cu surface
  • 文献类型:   Article
  • 作  者:   KAGESHIMA H, WANG S, HIBINO H
  • 作者关键词:   graphene, firstprinciples calculation, cvd growth
  • 出版物名称:   APPLIED PHYSICS EXPRESS
  • ISSN:   1882-0778 EI 1882-0786
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.35848/1882-0786/ac0ece
  • 出版年:   2021

▎ 摘  要

The role of edge termination is theoretically studied for the growth direction selectivity in chemical vapor deposition of graphene heterostructures with hexagonal boron nitride. It is found that the graphene island with hydrogen-free edge and the hexagonal boron nitride island with hydrogen-terminated edge induces the lateral and the vertical growth of the heterostructures we have experimentally observed. The mechanism of the different edge terminations is also discussed based on the H adsorption kinetics.